SPIE Advanced Lithography 2012 - Conference & Exhibition

12 – 16 February 2012

Venue

United States, San Jose, 150 W San Carlos, San Jose, California

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About SPIE Advanced Lithography 2012 - Conference & Exhibition

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Extreme Ultraviolet (EUV) Lithography

+ Alternative Lithographic Technologies

+ Metrology, Inspection, and Process Control for Microlithography

+ Advances in Resist Materials and Processing Technology

+ Optical Microlithography

+ Design for Manufacturability through Design-Process Integration

+ Advanced Etch Technology for Nanopatterning

Courses: Advanced Lithography 2012 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including EUV and double patterning. 2012 course lists and descriptions will be available September 2011.

Thematic sections

Exhibition Overview:

The Advanced Lithography Exhibition is a highly regarded, 50-company exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.

See the latest technology in advanced lithography:

+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

+ Metrology, inspection, OPC, and process control

+ Design and manufacturing software

+ Materials and chemicals

+ Imaging equipment

+ Lasers

+ Resist materials and processing

+ Nano-imprint

+ IC and chip fabrication

+ Nanoscale imaging

Exhibition Dates and Hours: